Syllabus
1) Basic terms: surface, interface, thin film
2) Surface wettability, surface energy, contact angle, the hysteresis of contact angles
3) Wettability regimes: Wenzel, Cassie-Baxter (lotus vs. rose petal effects and gecko state), superhydrophobic surfaces from hydrophilic materials, wettability of surfaces with open and closed pores, anti-icing protection of surfaces
4) Overview of methods of surface modification by chemically wet processes: chemical etching, application of Langmuir-Blodgett films and self-assembled monolayers (SAM), electrolytic processes of thin film deposition
5) Vacuum methods of surface modification: chemical etching, chemical vapor deposition (CVD) and epitaxy, hot filament-initiated chemical deposition (iCVD), atomic layer deposition (ALD)
6) Plasma surface modification aimed at changing the structure and chemical composition of the surface: plasma etching and reactive ion etching, modification of inorganic and polymeric surfaces by low-pressure plasma and atmospheric pressure plasma, plasma immersion ion implantation (PIII)
7) Plasma-enhanced chemical vapor deposition (PECVD) of thin films, plasma polymerization for the deposition of hydrocarbon (diamond-like), fluorocarbon, organosilicon, nitrogen-, and oxygen-containing plasma polymers in the form of thin films and nanoparticles
8) Surface modification for biomedical applications
Annotation
Intended changes of surface and interface properties are realized by methods that are summarized under the term: surface modification. The lecture introduces up-to-date survey of the modification methods aplicable to organic and inorganic materials and points out their use in technical and biomedical fields.