Syllabus
Basics of scanning probe microscopy. Force interaction between tip and surface.
Resolution and measurement artifacts. Contact, semi-contact and non-contact measurement modes.
Advanced measurement modes (local electrical, viscoelastic and tribological properties). AFM spectroscopy.
Statistical analysis of surfaces. X-ray photoelectron spectroscopy.
Principle of the method, sources of X-rays, electron analyzer. Qualitative and quantitative analysis.
Surface sensitivity. Auger electrons.
Chemical shift. Method limitations.
Data processing methods, CASA XPS analysis. Surfaces and thin films vs. radiation in the optical field.
The importance of individual spectral fields. Absorption and interference methods.
Fourier spectroscopy. Reflection of polarized light, principle of ellipsometry.
Accuracy and sensitivity of ellipsometry, constraints. Ellipsometric analysis of optically non-trivial structures.
Annotation
Elelments of scanning probe microscopy. Resolution. Contact, semi-contact and non-contact measurement regimes. Advanced regimes of measuremen. AFM spectroscopy. Statistical analysis of surfaces..
X-ray photoelectron spectroscopy, method sources. Qualitative and quantitative analysis. Surface sensitivity. Auger electrons. Chemical shift.. Limitations of the method. Data evaluation. Surfaces and thin films vs. radiation in optical range. Significance of individual spectral ranges. Absorption and interference methd. Fourier spectroscopy.
Reflection of polarized light, ellipsometry.