Syllabus
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1. Thin film deposition techniques -physical methods Vacuum evaporation (equilibrium vapor pressure, evaporation rate, angular dependence of the evaporation flux, construction of evaporators , evaporation of alloys and compounds, electron beam evaporation, MBE). Sputtering (basic ideas, sputtering systems, magnetron, comparison of sputtering and evaporation). Laser ablation. Electron beam ablation. Ionised cluster beam deposition. *
2. Thin film deposition techniques -chemical methods CVD (decomposition, disproporciation, transport reactions,VLPCVD, PECVD, MOCVD). Anodic oxidation, LB films. *
3. Methods of deposition rate measurement and thickness measurement Measurement in a flux of vapors. Quartz oscilator technique. Optical methods (Tolansky method, FECO, spectral reflectivity measurements). *
4. Techniques of measurement of thin film and surface morphology TEM, SEM, STM, AFM, LEEM, FIM, FEM. *
5. Techniques for determination of thin film structure and composition Difrakční metody. Spektroskopie. Interakce s ionty (RBS, SIMS). *
6. Substrate treatment Chemical treatment. Etching. Annealing. *
7. Litography, masking and nanopatterning Ion etching. Selective etching. Using of photoresists. *
8. Thin film properties Hardness , adhesion and conductivity measurements.
Annotation
Basic concepts of termodynamic and vacuum physics. Growth types and phases of thin film growth.
Overwiev of thin film deposition methods - CVD, vacuum evaporation, sputtering methods, laser ablation, electron beam ablation, principles, examples a comparison. Methods of thickness and deposition rate measurement.
Methods for determination of morphology and composition of thin films. Adhesion and hardness of thin films.
Preparation and cleaning of substrates for thin film technologies. Preparation of defined thin film structures - masking and litography.