Classes
Publications
- Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering2012 | Faculty of Mathematics and Physics
- Highly ionized physical vapor deposition plasma source working at very low pressure2012 | Faculty of Mathematics and Physics
- Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma2012 | Faculty of Mathematics and Physics
- Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 us and 500 us2011 | Faculty of Mathematics and Physics
- Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films2010 | Faculty of Mathematics and Physics
- Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering2010 | Faculty of Mathematics and Physics
- Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System2023 | Faculty of Mathematics and Physics
- Optical emission spectroscopy study of plasma parameters in low-pressure hollow cathode plasma jet and planar magnetron powered by DC and pulsed DC supply2022 | Faculty of Mathematics and Physics
- Diagnostics of He+N2+CO2 Plasmas in Non-segmented Cylindrical Cathode Magnetron by DC Supply2022 | Faculty of Mathematics and Physics
- Plasma Diagnostics of Titanium Nitride for Plasmonic Study Generated Through Hollow Cathode Plasma Jet2022 | Faculty of Mathematics and Physics
Loading network view...