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The interfacial properties of MgCl2 thin films grown on Ti(0001)

Publication at Faculty of Mathematics and Physics |
2010

Abstract

Photoelectron spectroscopy with synchrotron radiation (SRPES), temperature programmed desorption (TPD), low energy electron diffraction (LEED), and ion-scattering spectroscopy (ISS) were used in order to study the MgCl2/Ti(0001) interface. A clear hexagonal LEED pattern confirmed the presence of a quite large grain of Ti(0001) on the substrate while no new superstructure was formed after deposition of MgCl2 either at room or at elevated temperatures.

A series of high resolution spectra after step by step MgCl2 deposition and gradual annealing indicated strong interaction between MgCl2 and the substrate while ISS measurements showed that there is no migration of Ti atoms into the deposit layers. Additional quantities of deposited MgCl2 grew stoichimetrically on top of the chemically active interface.

Annealing at similar to 350 degrees C caused clustering of the MgCl2 multilayer and TPD results showed that they desorbed stoichimetrically at temperatures between 360 and 380 degrees C.