Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films

Abstract

Time-resolved comparative study of dual magnetron sputtering dual-MS_ and dual high power impulse magnetron sputtering dual-HiPIMS systems arranged with closed magnetic field is presented.

Keywords

• Dual-MS
• dual-HiPIMS
• Langmuir probe
• Ti-Cu thin films