Deposition of amino-rich coatings by RF magnetron sputtering of Nylon: In-situ characterization of the deposition process
2011
Abstrakt
This study concerns the detailed characterization of RF magnetron sputtering of Nylon in Ar, Ar/N2 and N2/H2 working gas mixtures: the main attention is paid to the evaluation of influence of operational parameters on the deposition rate, plasma composition as well as on the chemical composition of the deposited thin films without their exposure to open air.