Characterization of a Low-pressure Inductively Coupled Plasma Discharge Sustained in Ar/O2/N2 Ternary Mixtures and Evaluation of its Effect on Erosion of Biological Samples
2011
Abstrakt
Detailed characterization of a low-pressure ICP discharge sustained in an Ar/O2/N2 ternary mixture is performed in this study. The main attention is devoted to the evaluation of the dependence of parameters important for treatment of biological samples on the working gas mixture composition.
Subsequently, the capability of plasma sustained in ternary gas mixture to effectively etch biological contaminants is tested on examples of bacterial spores and poly-L-histidine.