Publikace na Matematicko-fyzikální fakulta |
2011
Abstrakt
Plasma polymer nanostructures were prepared by cluster beam deposition using a nanocluster source based on RF planar magnetron. Clusters were deposited on glass or silicon substrates without mass separation in order to get high deposition rates.
C:H plasma polymer clusters with a typical size of about 100 nm were prepared by RF discharge in argon/hexane atmosphere. The influence of deposition conditions was studied with respect to size distribution (AFM and SEM), chemical and physical properties (XPS and FTIR) of resultant clusters.