Abstrakt
Presented computer model simulates an interaction of low-temperature Ar/O2 plasma with conductive solid substrate. Mixtures of argon with electronegative gases are often used in material processing technologies.
The results can also be used for an analysis of Langmuir probe measurements. Electrostatic potential, number densities of species contained in plasma near the biased substrate and fluxes of the species to the substrate are studied in both static and dynamic regimes.
Presented two-dimensional simulation was written in C language with additional parallel computing and force calculation libraries. Computational technique is a hybrid Molecular Dynamics / Monte Carlo particle approach with advanced collisions-computing method and a two-dimensional Particle in Cell force calculation.