Computational study of sheath structure for plasma-assisted technologies in the presence of electronegative plasma
Abstrakt
A detailed description of plasma solid interaction is desirable for many technological applications such as plasma surface treatment and also for the development of plasma diagnostic techniques. To solve this rather complex problem, especially in the case of highly collisional or chemically active plasmas, methods of computational physics have to be used.
In this paper, we present results of two-dimensional simulations based on the combination of molecular dynamics with particle-in-cell force calculation and the Monte Carlo method. An electropositive argon plasma with parameters taken from a DC glow discharge and an idealized Ar/O-2 plasma were studied for uneven substrates in order to determine the behaviour of plasmas with different electronegativities.