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Investigation of the Ti/MgCl2 interface on a Si(111) 7 x 7 substrate

Publication at Faculty of Mathematics and Physics |
2012

Abstract

Photoelectron spectroscopy with synchrotron radiation, low energy electron diffraction, and ion-scattering spectroscopy were used in order to study the Ti/MgCl2 interface grown on an atomically clean Si(111) 7 x 7 substrate. A series of high resolution spectra after deposition of a thick MgCl2 layer, step by step deposition of Ti and gradual annealing, indicated a very reactive interface even at room temperature.

Strong interaction between the incoming Ti atoms and the MgCl2 layer, leads to the formation of Ti2+ and Ti4+ oxidation states. The interfacial interaction continues even at multilayer Ti coverage mainly by the partial disruption of Mg-Cl bonds and the formation of Ti-Cl sites, rendering this interface a very promising UHV-compatible model of a pre-catalyst for olefin polymerization.

After the final annealing, the MgCl2 multilayers desorb while Ti remains on the surface forming a silicide layer on which Cl and Mg atoms are attached. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4727760]