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Ablation Threshold of XUV Laser Ablation of LiF

Publikace na Matematicko-fyzikální fakulta |
2012

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

The first Atomic Force Microscopy (AFM) results are presented, obtained on the surface of a typical ionic crystal, i.e., lithium fluoride, exposed to focused nanosecond pulses delivered from a new source of Extreme Ultraviolet (XUV; laser wavelength: 46.9 nm) laser radiation. The desktop capillary-discharge XUV laser works in pulsed regime.

Our studies of the interaction of the XUV laser radiation with LiF is motivated by potential utilization of the laser for Pulsed Laser Deposition (PLD). Exposed samples have been investigated not only by AFM but also with an optical profiler (White Light Interferometry-WLI) for a comparison of both the techniques.