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Carrier diffusion in microcrystalline silicon studied by the picosecond laser induced grating technique

Publikace na Matematicko-fyzikální fakulta |
2001

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

We report on the picosecond laser induced grating technique applied to hydrogenated microcrystalline silicon (c-Si:H) and aimed at studying the photocarrier diffusion coefficient D.