Publication at Faculty of Mathematics and Physics |
2013
Abstract
Processing of polymeric materials by plasma technologies receives considerable attention in food packaging industry. The main objective is to improve barrier properties of polymeric foils by deposition of thin barrier layer.
This study is focused on the deposition of a-C:H and SiOx films by means of plasma polymerization using either n-hexane or HMDSO as precursors. Barrier properties of produced films are presented alongside with their chemical structure and wettability.