Abstrakt
Glassy carbon (GC) substrates were treated by the oxygen plasma over several periods of time. Scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM) study showed the dramatic influence of oxygen plasma on the morphology of glassy carbon.
The treatment leads to the formation of nanostructured surface, which consists of well separated rod-like nanostructures oriented perpendicularly to the substrate surface. The surface roughness was found to increase with increasing treatment time.
By using magnetron co-sputtering of platinum and cerium oxide we can prepare oxide layers continuously doped with Pt atoms during the growth. This technique combines etching of the carbon substrate and growth of the deposit.
This leads to the formation of high surface area catalyst which makes this method promising for production of thin film catalysts.