Abstrakt
Adsorption and reaction of formic acid on stoichiometric CeO2(111), partially reduced CeO2-x, and Pt/CeO2(111) films prepared on Cu(111) were studied by means of synchrotron radiation photoelectron spectroscopy (SRPES), resonant photoemission spectroscopy (APES), infrared reflection absorption spectroscopy (IRAS), and temperature-programmed desorption (TPD). On all studied samples, the principal species formed during formic acid adsorption below 160 K were formate and molecular formic acid.
In the presence of Pt particles, formate species were predominantly localized on Pt at 100 K, and on ceria at or above 300 K. Below 400 K, molecular formic acid decomposes to formate with partial release of CO2, CO, hydrogen, and water.
Analysis of the TPD fragmentation suggests additional evolution of methane. Above 400 K, desorption of CO2, CO, hydrogen, and water is observed.
This process is controlled by the stoichiometry of ceria and the presence of Pt particles. In particular, desorption of CO2 is suppressed on CeO2-x but is enhanced on Pt/CeO2.
APES suggests that the reaction of formic acid does not alter the oxidation state of cerium cations on CeO2(111). By contrast, we observed significant reoxidation on partially reduced CeO2-x, between 250 and 400 K, followed by reduction between 400 and 500 K.