Investigation of the near-surface structures of polar InN films by chemical-state-discriminated hard X-ray photoelectron diffraction
2013
Abstract
Near-surface structures of polar InN films were investigated by laboratory-based hard X-ray photoelectron diffraction (HXPD) with chemical-state-discrimination. HXPD patterns from In 3d(5/2) and N 1s core levels of the In-polar and N-polar InN films were different from each other and compared with the simulation results using a multiple-scattering cluster model.
It was found that the near-surface structure of the In-polar InN film was close to the ideal wurtzite structure. On the other hand, on the N-polar InN film, defects-rich surface was formed.
In addition, the existence of the In-polar domains was observed in the HXPD patterns. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789373]