Abstrakt
We present results of a two-dimensional particle model of plasma–solid boundary. The model follows trajectories of charged species in plasma which form sheath and pre-sheath layers in the vicinity of a biased substrate.
We studied sheath parameters and particle transport through the sheath in high-density argon plasma containing sputtered metal ions. The plasma parameters were taken from a volume-averaged model of inductively coupled plasma during ionized physical vapour deposition (IPVD) using magnetron sputtering.
Our model simulated the capability of IPVD to ll the high-aspect-ratio trenches and evaluated local fluxes, energy and angular distributions of ions impinging on the trench. We observed that the substrate bias influenced the energy of ions but not their flux.
Therefore, these quantities can be regulated independently by changing bias and magnetron power.