Abstract
Thermal reactions of the superelectrophilic dications SiF32+ with molecular nitrogen lead to the efficient formation of the new dication N2SiF22+. The results have potential implications for plasma chemistry and plasma etching.
Thermal reactions of the superelectrophilic dications SiF32+ with molecular nitrogen lead to the efficient formation of the new dication N2SiF22+. The results have potential implications for plasma chemistry and plasma etching.