Abstrakt
Multi plasma jet system with 4 independent nozzles working on the principle of surface-wave discharge (SWD) has been developed. The system was optimized and used for plasma-enhanced chemical vapor deposition (PECVD) of nominally pure and Al and Mn doped ZnO thin films.
The surfatron source was powered by a microwave magnetron generator working at a frequency of 2.45 GHz with the output power of 300W per surfatron. The time-resolved properties of low-pressure plasma jet working under deposition conditions in pulse mode were studied using Langmuir probe.
It was found that the plasma density inside the active plasma jet is about 10(17) m(-3) and electron effective temperature can reach approximately 3 eV. The set of ZnO samples with a thickness of 300nm were prepared on Si, ITO and quartz substrate and were analyzed by XRD, SEM, EDX, UV-light amperometry and optical ellipsometry.
All samples under study were crystalline in nature, revealed n-type conductivity, were photo-electrochemically active and have optical band gap close to 3.5 eV. The deposition condition had a strong influence on the grain size and surface morphology.