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Study of the development of defects in Si PIN diodes exposed to 23 GeV/c protons

Publikace na 1. lékařská fakulta |
2015

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

Studying the development of crystallographic defects in PIN diodes is the focus of the RD-50 (CERN) research project. The study was carried out on Si PIN diodes manufactured and used in the Czech Republic.

The Si PIN diodes were irradiated with 23 GeV/c protons at doses ranging from 0.5 to 43 Gy. The Si PIN diodes were calibrated in a 23 GeV/c proton source [1], and the energy traps of the defects produced were measured by the DLTS method.

The IV characteristics and the parameters of the defects were studied. The 23 GeV/c protons produce typical crystallographic defects and, at higher doses, bring about their regrouping thus giving rise to a new generation of defects.

Defects are classified by their energy levels in the forbidden band from the conduction band. The mechanism influencing the parameters of the defects is discussed.

The study of defects in silicon is important for silicon-based electronic elements used in cosmic research because of their effects on the operability and reliability of electronic equipment installed in satellites. Another application is the dosimetry measurements involving various types of particle accelerators.