The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime
Abstrakt
TiO2 nanoparticles are being investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of a gas-phase deposition using a low pressure hollow cathode plasma jet.
The material of the cathode is pure titanium. Oxygen was introduced separately from argon through an inlet in the chamber.
The nanoparticle growth mechanism is qualitatively discussed. The morphology of the surfaces of thin films was investigated by an atomic force microscope.
The chemical composition of the thin films was investigated by means of an energy-dispersive x-ray analysis and x-ray photoelectron spectroscopy. A cylindrical Langmuir probe and a fiber optic thermometer was used for measurements of plasma parameters and neutral gas temperature respectively.
The relationship between plasma parameters and the films' morphology is particularly explained.