Deposition of Iron Oxide Films by Plasma Jet Sputtering System for Dye-sensitized Solar Cell

Abstrakt

The dye-sensitized solar cell (DSSC) history and perspectives is reviewed. Band gap designs of various semiconductor films from iron oxide to iron pyrite are discussed.

The hollow cathode plasma jet (HCPJ) sputtering technique at both DC and high power DC pulsed regimes is described with respect to iron oxide film deposition. The first results of measuring films by atomic force microscopy (AFM), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDX) are presented.

Klíčová slova

• Iron Oxide Films
• Plasma Jet
• Sputtering
• Dye-sensitized Solar Cell