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Diffuse X-ray scattering from local chemical inhomogeneities in InGaN layers

Publikace na Matematicko-fyzikální fakulta |
2018

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

Diffuse X-ray scattering from random chemical inhomogeneities in epitaxial layers of InGaN/GaN was simulated using linear elasticity theory and kinematical X-ray diffraction. The simulation results show the possibility of determining the r.m.s. deviations of the local In content and its lateral correlation length from reciprocal-space maps of the scattered intensity.

The reciprocal-space distribution of the intensity scattered from inhomogeneities is typical and it can be distinguished from other sources of diffuse scattering such as threading or misfit dislocations.