Abstrakt
High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent sputtering technology used for the physical vapor deposition of thin film coatings based upon magnetron sputtering with a high voltagecurrency signt pulsed power source. Interest in the method of high-power impulse sputtering has grown steadily.
Therefore, the task of first priority is to study the results of work already available in the scientific world in the field of high-power magnetron sputtering to determine the level of knowledge of this direction, as well as to identify the main trends in the development of new coating methods.This literature review outlines the state of the art in HiPIMS, as well as the foundations for more detail research of physical processes of high-power sputtering. The motivation for this review is to provide a brief summary of the HiPIMS technology, its history, its underlying physical mechanisms and diagnostic.