Abstrakt
The effect of PECVD deposition of amorphous Silicon on perovskite layers, and perovskite layers prepared on pre-deposited a-Si are investigated in the interest of determining the interaction between the two materials and developing a-Si as a material for direct integration into perovskite cells. This may include as selective contacts or carrier transport layers, an encapsulation material, or in other ways.
Doped and intrinsic a-Si layers are deposited at a range of temperatures, with the resulting structures characterized by methods including photoluminescence, SEM imaging, absorption, resistivity measurements, and degradation rate. Comparisons are made to layers deposited on glass without any PECVD deposition carried out and layers subjected to heating without PECVD deposition.
The implications for use of a-Si in perovskite cells are explored.