Photochemical vapor generation of cobalt for detection by inductively coupled plasma mass spectrometry
Abstrakt
This work focused on the photochemical vapor generation of cobalt. Volatile species were generated in a flow-injection system, employing a high-efficiency flow-through UV photoreactor and a formic acid based medium, and were introduced by an argon carrier into an inductively coupled plasma mass spectrometer for detection.
Optimal generation conditions were found as 10% (v/v) formic acid and 4 mol L-1 ammonium formate with a 4 mL min-1 flow rate which corresponds to irradiation time of around 13 s. The influence of various metal sensitizers of photochemical reaction was investigated and only Cu2+ ions exhibited a positive effect on generation efficiency.
Interferences from common inorganic anions (NO- , Cl-, SO2-) were 3 4 also examined. Lastly, the limit of detection and repeatability (at 250 ng L-1) were determined to be 1.3 ng L-1 and 4.1%, respectively.