Abstrakt
Photochemical vapour generation of bismuth was successfully coupled with non-dispersive atomic fluorescence spectrometry for the first time. Volatile species of Bi were generated, using a standard mercury low-pressure tube lamp and a coiled reactor, from a reaction medium which was composed of acetic and formic acid, Co2+ ions were used as a sensitizer.
Optimization of atomization conditions in a flame-in-gas-shield atomizer was performed. This methodology was compared to the commonly employed hydride generation approach.
Absolute limit of detection of 6.8 pg was achieved with photochemical vapour generation, which is still about 7 times worse than with hydride generation. The developed methodology was successfully verified by Bi determination in a reference material of water.