Analytical Evaluation of Plasma Parameters by Optical Emission Spectroscopy in Low-Pressure Hollow Cathode Plasma Jet and Planar Magnetron System by DC and Pulsed DC Excitation Sourc
Abstrakt
Optical emission spectroscopy (OES) unified with the models of plasma light emission becomes a non-intrusive and versatile method for plasma parameters determination. Each spectral line in emission spectroscopy corresponds to an optical transition between two quantum levels of atom/molecule.
The number density of gas species in the upper state determines the spectral line intensity. The spectral line intensities regulate densities of species in various states.
With the utilization of the modified Boltzmann equation and line intensity ratios, one can calculate the electron temperature (Te) and electron density (ne). The analytical evaluation of plasma parameters in the low-pressure regime for hollow cathode plasma jet (HC) and planar magnetron system (PMS) in presence of DC and pulsed-DC excitation source was performed successfully.
The effect of various processing parameters like power, working pressure on plasma parameters have been investigated in presence of argon (Ar) gas atmosphere.