Abstract
Conventionally used boron-doped diamond (BDD) possesses polycrystalline structure, resulting from the BDD deposition on diamond nanoparticles serving as growth centres. In this contribution, electrochemical properties of rough polycrystalline BDD were compared with flat BDD surfaces.
The latter were attained by (i) BDD deposition on diamond monocrystals and (ii) chem-mechanical polishing of polycrystalline BDD. The electron transfer (ET) kinetics was studied using cyclic voltammetry and various redox markers.
Clearly, ET is dependent on the doping level, and in the case of (i), another factor influencing ET is the diamond crystal orientation. In general, obtained results indicate that the studied flat BDD surfaces exhibit enhanced ET kinetics, compared to rough polycrystalline diamond surfaces.