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Plasma-based metallization of textiles

Publikace

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

In this study, we investigate the possibility to metalize selected types of textile materials by means of low-pressure magnetron sputtering. The metallization is performed using a water-cooled, 2" DC planar magnetron equipped with a silver target.

The sputtering is performed using Ar as working gas, at the pressure of 3 Pa and DC magnetron current of 300 mA. It is shown that this simple technique allows to effectively coat the textiles with a thin Ag layer and thus modify their properties (wettability, antibacterial properties, etc.).