Abstract
Layered materials play a crucial role in modern device-based applications due to their unique properties, which can be unlocked through the exfoliation of layered crystals to monolayers. While several exfoliation methods have been developed, Au-assisted exfoliation has recently shown potential for producing large-area monolayers.
However, this method promotes charge transfer that limits (opto)electronic applications of exfoliated materials. Here, we present a method of preparing large-sized monolayer flakes using Au-assisted exfoliation followed by chemical etching of Au.
We characterize the samples using photoelectron and optical spectroscopic techniques and fabricate field-effect transistors and photodetectors to demonstrate the suitability of our method for large-area optoelectronic devices. Our findings highlight the technique's ability to preserve the material's intrinsic physical and chemical properties, opening up new possibilities for a wider range of applications.