XRD study of thickness dependence of crystallization and stresses in TiO2 thin films

Abstract

In this work a complex X-ray diffraction (XRD) study of thin TiO2 films on Si substrates with different thicknesses (50-2000 nm) prepared by magnetron sputtering is presented. Crystallisation process of amorphous films was studied in-situ.

XRD reflectivity, texture and stress measurements were performed ex-situ. Other amorphous and nanocrystalline powders were also measured for comparison.

Keywords

• study
• thickness
• dependence
• crystallization
• stresses
• films