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Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure (Art. No. 105204)

Publication at Faculty of Mathematics and Physics |
2009

Abstract

Optical, photo-electrochemical, crystallographic and morphological properties of TiO2 thin films prepared by high power impulse magnetron sputtering at low substrate temperatures ({65 C) without post-deposition thermal annealing are studied.