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Diffuse X-Ray Scattering from Semiconductor Nanostructures

Publication at Faculty of Mathematics and Physics |
2009

Abstract

X-ray scattering methods are frequently used for the investigation of semiconductor nanostructures. From the distribution reciprocal space of diffusely scattered intensity, it is possible to determine the spatial correlation properties of the nano-objects, their shapes, and the elastic strains in and around the nano-objects as well as their local chemical compositions.

In this chapter, we present basic theoretical approaches for the description of diffuse X-ray scattering from nanostructures and present some experimental examples.