In-Situ Study of Time and Thickness Dependence of Crystallization of Amorphous TiO2 Thin Films and Powders.
2009
Abstract
In this work, time dependences of crystallization of amorphous thin films on Si substrates with different thickness (50-2000 nm) prepared by magnetron sputtering were studied by in-situ measurements in high-temperature chamber in laboratory X-ray diffractometer X-Pert Pro at several temperatures. They were selected below the temperature where fast crystallization appears (about 220 °C).
The process is then slow and allows detailed time in-situ investigations even in laboratory conditions. For comparison, amorphous and nanocrystalline powders were measured in the chamber as well.