- High Power Impulse Magnetron Sputtering: Current Research and Diagnostic2019 | Faculty of Mathematics and Physics
- Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering2012 | Faculty of Mathematics and Physics
- Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering2013 | Faculty of Mathematics and Physics
- Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges2014 | Faculty of Mathematics and Physics
- Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films2010 | Faculty of Mathematics and Physics
- Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges2013 | Faculty of Mathematics and Physics
- Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges2023 | Central Library of Charles University
- Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture2020 | Faculty of Mathematics and Physics
- Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 us and 500 us2011 | Faculty of Mathematics and Physics
- Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure (Art. No. 105204)2009 | Faculty of Mathematics and Physics
- Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma2012 | Faculty of Mathematics and Physics
- Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths2023 | Faculty of Mathematics and Physics
- The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering2019 | Faculty of Mathematics and Physics
- Ionized vapor deposition of antimicrobial Ti-Cu films with controlled copper release2014 | Faculty of Mathematics and Physics
- Highly ionized physical vapor deposition plasma source working at very low pressure2012 | Faculty of Mathematics and Physics
- Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition2017 | Faculty of Mathematics and Physics
- Magnetron sputter deposition of silver onto castor oil: The effect of plasma parameters on nanoparticle properties2021 | Faculty of Mathematics and Physics